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Comparison ledger

VHEversus160 XP Ion

Axcelis VHE, Varian 160 XP Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
VHEAxcelis
OEMAxcelisVarian
CategoryIon ImplantationIon Implantation
Wafer size8"—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones2001 Legacy—
Control system——
Generation——
FamilyAxcelis VHEVarian 160 XP Ion
Specifications
Wafer size8" wafer convertible[1]—
ConfigurationFull disk 17 wafers[1]150mm High Current IMP[2]
SourceBernas[1]—
Extraction systemTriple axes[1]—
GasesBoron, Phosfine[1]—
Max Implantation Energy5000 KeV[1]—
Max Extraction Boltage90 KeV[1]—
OrienterFlat[1]—
MakeAxcelis[1]—
ModelVHE[1]160 XP Ion[3]
Wafer sizes6 inch[1]—
Wafer convertible6 inch - 8 inch[1]—
Full disk capacity17 wafers[1]—
Wafer tiltIncluded[1]—
Max extraction voltage90 KeV[1]—
Wafer convertible range6" - 8" wafer convertible[1]—
Heat exchangerIncluded[1]—
Load and unload locksIncluded[1]—
Source extraction alignment jigIncluded[1]—
AMUIncluded[1]—
Beamline columnIncluded[1]—
Mechanical clampIncluded[1]—
PFSHD 2001[1]—
OEM—Varian[3]
Category—Ion Implantation[2]
Tool type—ion implanter[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]Equipment inventory listing