Waferpedia

Comparison ledger

017-0024-01 PrealignerversusModel 2000

Brooks 017-0024-01 Prealigner, OAI Model 2000, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMBrooksOAI
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBrooks 017-0024-01 PrealignerOAI Model 2000
Cited variants—
Specifications
Product category—UV Exposure Systems[2]
Type—Edge-bead and UV flood exposure system[1]
Exposure beam size—Up to 300mm diameter[1]
Beam divergence—< 2.0° (1/2 angle)[1]
Beam spectrum—Near UV, Mid UV, Deep UV[1]
Beam uniformity—±5.0%[1]
Timer—0.1 to 999.9 sec. (0.1 sec. increments)[1]
Power supplies—200W to 5,000W[1]
Power regulation—Better than ±0.5%[1]
Intensity control—Dual channel optical feedback loop with ±2% precision and long term repeatability[1]
Wafer capacity—To 300mm[1]
Substrate transfer—Cassette-to-cassette[1]
Handling—Vacuum arm (end effector)[1]
Flat orientation—±1 degree[1]
Precision—±25 microns[1]
Z precision—±12.5 microns[1]
Electrical—208/60Hz 3-phase[1]
Vacuum—25" Hg[1]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]oainet.speedstorecdn.comoainet.speedstorecdn.com
  2. [2]oainet.comoainet.com