OAI
Model 2000
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The OAI Model 2000 is an edge-bead and UV flood exposure system. The OAI Model 2000 includes a UV lightsource, an intensity controlling power supply, and a robotic substrate handling subsystem. The OAI Model 2000 has wafer capacity up to 300mm.[1]
Power
200W to 5,000W[1]
Vacuum
Vacuum arm (end effector)[1]
Performance
±5.0%[1]
Optics
UV Exposure Systems[2]
What it is
The OAI Model 2000 is an edge-bead and UV flood exposure system. The OAI Model 2000 may be configured either as an edge-bead exposure tool or as a flood exposure system. The OAI 2000SM is the edge-bead configuration. The OAI 2000FL is the flood exposure configuration. The Model 2000 includes a UV lightsource, an intensity-controlling power supply, and a robotic substrate handling subsystem.[1]
How it works
The OAI Model 2000 uses UV lightsources that provide uniform intensity beams with divergence half-angles of less than two degrees. The OAI Model 2000 uses intensity controller sensors linked directly to the lightsource for intensity monitoring. The OAI Model 2000 uses a microprocessor-controlled robotic substrate handling system that may be programmed for a variety of substrate sizes. The OAI Model 2000SM uses standard shadow mask technology for edge-bead exposure. The shadow mask capability allows top-side patterning while the substrate is held in very close proximity to the mask. At a separation of twenty-five microns, the system is capable of six micron resolution.[1]
Where it fits in the process flow
The OAI 2000FL is used to augment and enhance photolithography processes in production and research and development settings. The OAI 2000SM is intended for edge-bead exposure using shadow masks. The OAI Model 2000SM can reduce particle contamination associated with routine wafer handling. The OAI 2000FL exposes the entire substrate at one time, and its throughput is independent of pattern complexity.[1]
Applications
The OAI 2000FL is used for photoresist stabilization and modification. The OAI 2000FL is used for image reversal processes. The OAI 2000FL is used for PCM processes. The OAI 2000SM supports edge-bead exposure by changing the shadow mask to change the exposure pattern.[1]
What do the numbers mean?
Power & electrical2
Vacuum & pumping2
Wafer handling2
Optics & imaging4
- Intensity control
- Dual channel optical feedback loop with ±2% precision and long term repeatability[1]
Performance3
Configuration & options5
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| OAI 2000SM | — | — | Edge-bead exposure system configured for standard shadow mask technology. | oainet.speedstorecdn.com[1] |
| OAI 2000FL | — | — | Flood exposure system used to augment and/or enhance photolithography processes in production and R&D settings. | oainet.speedstorecdn.com[1] |
What replaced it?
Related models
- siblingOAI Model 32— Listed under the UV Exposure Systems section of OAI's Resources page.source[2]
- siblingOAI Model 2012— Listed under the UV Exposure Systems section of OAI's Resources page.source[2]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Can the OAI Model 2000 be configured for different exposure modes?
The OAI Model 2000 may be configured either as an edge-bead exposure tool or as a flood exposure system. The edge-bead version is the OAI 2000SM, and the flood version is the OAI 2000FL.[1]
Not publicly documented
The following facts about the Model 2000 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Model 2000 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Model 2000 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Model 2000 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Model 2000 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Model 2000 are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]oainet.speedstorecdn.com — oainet.speedstorecdn.comoainet.speedstorecdn.com
- [2]oainet.com — oainet.comoainet.com
Last updated Oct 19, 2026.
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