Comparison ledger
Brooks 017-0024-01 Prealigner, Quintel Q 4000 Series Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 017-0024-01 PrealignerBrooks | Q 4000 Series MaskQuintel |
|---|---|---|
| OEM | Brooks | Quintel |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Brooks 017-0024-01 Prealigner | Quintel Q 4000 Series Mask |
| Specifications | ||
| Configuration | — | Illumination Controller[1] |
| Make | — | Quintel[1] |
| Model | — | Q 4000 Series[1] |
| Tool type | — | Mask Aligner[1] |
| Printing modes | — | Vacuum and contact printing[2] |
| Substrate size | — | up to 100mm (4") diameter[2] |
| Mask size | — | 4" or 5"[2] |
| Alignment stage | — | Manual X-Y joystick and micrometer theta alignment stage[2] |
| Print resolution | — | 1 micron (with vacuum mode)[2] |
| Viewing system | — | VideoView CCTV splitfield/singlefield microscope with zoom[2] |
| Backside alignment | — | IR capability[2] |
| Exposure wavelengths | — | 365 nm (Channel A), 405 nm (Channel B)[3] |
| Gap spacing | — | 30 µm[3] |
| Lamp intensity unit | — | mW/cm²[3] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →