Comparison ledger
Brooks 017-0146-01 Prealigner, Canon iW, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 017-0146-01 PrealignerBrooks | iWCanon |
|---|---|---|
| OEM | Brooks | Canon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Brooks 017-0146-01 Prealigner | Canon iW |
| Cited variants | — |
|
| Specifications | ||
| Configuration | — | Parts Tool and pcb’s[2] |
| OEM | — | Canon[2] |
| Model | — | iW[2] |
| Equipment type | — | Stepper[2] |
| Reticle size | — | 6" square t=0.25"[1] |
| Reticle material | — | Quartz[1] |
| Pattern material | — | 2 layer Cr, 3 layer Cr[1] |
| Pellicle | — | Frame Pattern Side Only[1] |
| Wafer size | — | 4" thru 8" SEMI Standard, JEIDA, Notch / Flat[1] |
| Projection magnification | — | 1/2 X[1] |
| Numerical aperture | — | 0.24[1] |
| Field size | — | 50X50mm[1] |
| Exposure light | — | i-line (365nm)[1] |
| Light source | — | 2.0KW Super High Pressure Hg Lamp[1] |
| Intensity | — | 2500 W/m 2[1] |
| Uniformity | — | < 1.5%[1] |
| Resolution | — | <0.8µm[1] |
| Depth of focus | — | >4.0µm (0.8µm L&S)[1] |
| Image field deviation | — | <2.5µm[1] |
| Distortion | — | <±0.11µm[1] |
| Reticle rotation accuracy | — | <±0.02µm on wafer[1] |
| Reticle rotation repeatability | — | <0.05µm on wafer[1] |
| Wafer alignment | — | <0.10µm mean + 3sigma[1] |
| Focus repeatability | — | <0.10µm (3sigma)[1] |
| Leveling repeatability | — | <7ppm (3sigma)[1] |
| Minimum compensation range | — | >100ppm[1] |
| Step accuracy | — | <0.05µm (3sigma)[1] |
| Scaling | — | <±1.0ppm[1] |
| Orthogonality | — | <±1.0ppm[1] |
| Throughput | — | >120 wafers/hour Φ6", 50mm, 9 shots; >115 wafers/hour Φ8", 50mm, 14 shots[1] |
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