Canon
iW
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
The Canon iW is a lithography stepper. The Canon FPA-3000 iW uses i-line exposure at 365 nm with 1/2X projection optics, a numerical aperture of 0.24, and a 50 x 50 mm field size. The Canon FPA-3000 iW is specified for 4 inch through 8 inch wafers and for 6 inch square reticles with 0.25 inch thickness.[2]
How it works
The Canon FPA-3000 iW projects a reduced reticle image onto the wafer with 1/2X magnification. The Canon FPA-3000 iW uses a 2.0 kW super high pressure mercury lamp as its light source. The Canon FPA-3000 iW is specified with illumination intensity of 2500 W/m2 and uniformity of less than 1.5 percent.[2]
The Canon FPA-3000 iW is specified with wafer alignment of less than 0.10 µm mean plus 3 sigma. The Canon FPA-3000 iW is specified with focus repeatability of less than 0.10 µm at 3 sigma. The Canon FPA-3000 iW is specified with step accuracy of less than 0.05 µm at 3 sigma.[2]
Where it fits in the process flow
General reference — not yet source-verifiedA lithography stepper is used after wafer preparation, film deposition, resist coating, and soft bake. A lithography stepper is followed by post-exposure bake when the resist process requires it, then development, pattern inspection, and pattern transfer by etch or implant.
Applications
The Canon FPA-3000 iW is specified for printing performance of less than 0.8 µm resolution and greater than 4.0 µm depth of focus for 0.8 µm line and space. The Canon FPA-3000 iW is specified with throughput greater than 120 wafers per hour for 6 inch wafers at 50 mm with 9 shots and greater than 115 wafers per hour for 8 inch wafers at 50 mm with 14 shots.[2]
What do the numbers mean?
Vacuum & pumping1
Wafer handling5
Optics & imaging6
Performance4
Dimensions & facilities1
Configuration & options13
- Parts Tool and pcb’s[1]
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Canon FPA-3000 iW | i-line | — | — | servtechinc.com[2] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- Light source2.0KW Super High Pressure Hg Lamp[2]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What wafer sizes does the Canon FPA-3000 iW support?
The Canon FPA-3000 iW is specified for 4 inch through 8 inch wafers with SEMI Standard, JEIDA, notch, and flat formats.[2]
What reticle format does the Canon FPA-3000 iW use?
The Canon FPA-3000 iW is specified for 6 inch square reticles with 0.25 inch thickness. The reticle materials are specified as quartz with 2 layer Cr or 3 layer Cr pattern material, and the pellicle frame is specified on the pattern side only.[2]
What exposure wavelength and optics are specified for the Canon FPA-3000 iW?
The Canon FPA-3000 iW is specified with i-line exposure at 365 nm, 1/2X projection magnification, a numerical aperture of 0.24, and a 50 x 50 mm field size.[2]
Not publicly documented
The following facts about the iW are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the iW are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the iW are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the iW are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the iW is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the iW are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]servtechinc.com — servtechinc.comservtechinc.com
Last updated Oct 17, 2026.
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