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BDF 41 Diffusionversus1000 Hot Plate

Bruce BDF 41 Diffusion, CEE 1000 Hot Plate, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
OEMBruceCEE
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones1993 Original year shipped—
Control system——
Generation——
FamilyBruce BDF 41 DiffusionCEE 1000 Hot Plate
Cited variants
  • BDF 41 (4 Stack)[1]
  • DBTB-2 (DIRE-10)[2]
—
Specifications
Configuration5 zone heating elements[3]4"[4]
Tube Level 4 – Annealing in N2 and H2N2[3]—
TypeHorizontal diffusion furnace[1]Hot Plate[4]
Wafer size6 inch[3]—
Heating elements5 zone heating elements[3]—
Thermal flat zone40 inch[3]—
Tube levels4 tube levels[1]—
Process controllersModel 7355X Process Controllers[3]—
Loader controllersDiamond cantilever loaders and controllers Model DDC-2[3]—
Process tubeQuartz process tube sized for processing up to 6” dia. wafers[3]—
Flow stationHorizontal laminar flow load station[3]—
PaddlesSiC paddles on all tube levels[3]—
Load stationHorizontal laminar flow load station[3]—
Tube level 1 featureDirectInject Steam Generator System[3]—
Original year shipped1993[2]—
Wafer Size—4 inch[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]brucetechnologiesinc.combrucetechnologiesinc.com
  2. [2]brucetechnologiesinc.combrucetechnologiesinc.com
  3. [3]inventory listing
  4. [4]inventory listing