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Comparison ledger

100 602 Calibration KitversusWaferStorm 3303 Automated Solvent Processor

Cascade Microtech 100 602 Calibration Kit, Veeco WaferStorm 3303 Automated Solvent Processor, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
100 602 Calibration KitCascade Microtech
OEMCascade MicrotechVeeco
CategoryTest & ProbeTest & Probe
Wafer size—Load port-TDK with wafer mapping and RFID reader
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Veeco Waferstorm
Specifications
Configuration—Single 300mm FOUP load port for high volume platform[1]
Wafer size—Load port-TDK with wafer mapping and RFID reader[1]
Station 1—Solvent Immersion 200/300mm (Fill by NMP Fresh Supply)[1]
Model—WaferStorm 3303[1]
Load port—Single 300mm FOUP load port; load port-TDK with wafer mapping and RFID reader[1]
Wafer sizes—200/300mm; 200-mm adapter plate allows 200mm cassette in place of 300mm FOUP[1]
Construction—Stainless steel with mirror finish[1]
User interface—PC-based user interface with local data storage[1]
Data storage—SOL-based database RAID drive for control system and data storage[1]
Host interface—SECS/GEM software for host interface[1]
Fire suppression—CO2 Fire suppression system for 90" frame; IR detector, 120-degree viewing angle and Linear Heat Detector Wire[1]
Power backup—UPS battery backup for PC[1]
Status light—3-Color LED status light lower (red, yellow, green)[1]
Filtration—ULPA Filter with Air Ionizer bar (Standard ESD level l)[1]
Robotic wafer handler—Vertical, rotary, two paddle axes; additional paddle axis (2); vacuum paddles (4); wafer alignment with LED backlight, color camera, and PC image processing; handler cover drain[1]
Station 2—MLO Spin Process chamber with grip actuator and spindle motor; Haler chamber with exhaust pressure, temperature and cover interlock sensors; CCD camera for chamber monitoring and video archive with LED lighting; spin chuck-200/300mm (Active Edge Grip, Stainless Steel)[1]
Dispense Arm 2—Dual-position feedback; Dispense A: LPD stream (NMP Fresh or Recirculated, Heated); Dispense B: HPC Fan-spray (NMP Recirculated, Heated); Dispense C: HPC Needle-spray (NMP Recirculated, Heated); continuous-duty 35:1 high-pressure pump and high-pressure filter; heater-SS 2-kW single path (Dispense A); heater-SS 2-kW dual path (Dispense B&C)[1]
Dispense Arm 3—Dual-position feedback; Dispense A: LPD stream (NMP Recirculated, Heated); Dispense B: High-velocity spray (NMP Recirculated, Heated); shared heater-SS 3-kW, single path[1]
Wall-mounted dispenses—Stationary with adjustable nozzles; wall-dispense nozzle (NMP Recirculated or Fresh, Heated); shared heater-SS 3-kW, single path (Wall Dispense, Backside Rinse A&B)[1]
Backside dispenses—Adjustable nozzles; backside nozzle-A&B: LPD Stream (NMP Recirculated or Fresh, Heated)[1]
Chamber rinse—6 nozzles (NMP Recirculated, Ambient)[1]
Drain diverter Station 2—Teflon 3-way (NMP recirculation/Solvent drain)[1]
Station 3—SRD Spin Process chamber with grip actuator and spindle motor; Haler chamber with exhaust pressure, temperature and cover interlock sensors; CCD camera with LED lighting; O2 monitoring system with high-flow N2 purge and O2 sensor integrated into the chamber exhaust[1]
Spin chuck Station 3—200/300mm (Active Edge Grip, Stainless Steel)[1]
Dispense Arm 2 Station 3—Dual-position feedback; Dispense A: LPD stream (IPA Ambient); Dispense B: High-velocity spray (IPA Ambient)[1]
Dispense Arm 3 Station 3—Dual-position feedback; Dispense A: LPD stream (DIW, Ambient)[1]
Dispense Arm 4 Station 3—Dual-position feedback; N2 heated dispense with programmable 400-W heater, 0.003-µm filter[1]
Wall-mounted dispenses Station 3—Stationary with adjustable nozzles; wall-dispense nozzle A: (IPA, Ambient); backside nozzles-A&B: (IPA, Ambient); chamber rinse--6 nozzles (IPA, Ambient); drain diverter Teflon 3-way (IPA drain/Industrial drain)[1]
Heater-SS 3-kW, single path—6kW total heat (2)[1]
DFR solvent strainer—Triple-Stage with automatic flush feature[1]
Dispense A—LPD stream (NMP Fresh or Recirculated, Heated)[1]
Dispense B—HPC Fan-spray (NMP Recirculated, Heated)[1]
Dispense C—HPC Needle-spray (NMP Recirculated, Heated)[1]
Continuous-duty 35—1 high-pressure pump and high-pressure filter[1]
Wall-dispense nozzle—(NMP Recirculated or Fresh, Heated)[1]
Backside nozzle-A&B—LPD Stream (NMP Recirculated or Fresh, Heated)[1]
02 Monitoring system—High-flow N2 purge with 02 sensor integrated into the chamber exhaust[1]
Wall-dispense nozzle A—(IPA, Ambient) Backside dispenses with adjustable nozzles Backside nozzles-A&B: (IPA, Ambient)[1]

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Sources (1)Every fact above is drawn from these public sources
  1. [1]inventory listing