Comparison ledger
CEE 100, Ismeca NX 32, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100CEE | NX 32Ismeca |
|---|---|---|
| OEM | CEE | Ismeca |
| Category | Lithography | Lithography |
| Wafer size | 6" | 1 x Tube, 2 x Wafer |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | Ismeca NX 32 |
| Cited variants |
| |
| Specifications | ||
| Tool type | Spray Developer[1] | — |
| Accepts wafer size | up to 6" wafers[3] | — |
| Programmable programs | 10 programs[3] | — |
| Steps per program | up to 10 steps[3] | — |
| Programmable step parameters | Acceleration, Speed, Time[3] | — |
| Associated document | CEE Model 100CB Spinner.doc[3] | — |
| Wafer size | Up to 6 inches[3] | 1 x Tube, 2 x Wafer[5] |
| Programs | 10 programs each with up to 10 steps[3] | — |
| Control parameters | Acceleration, Speed, Time[3] | — |
| Equipment type | Spin coater[4] | Scanner[6] |
| Programming | 10 programs; up to 10 steps per program[3] | — |
| Step parameters | Acceleration, speed, time[3] | — |
| Configuration | — | 1 x Tube, 2 x Wafer[5] |
| Make | — | Ismeca[6] |
| Model | — | NX 32[6] |
| Wafer size hint | — | 1 x Tube, 2 x Wafer[5] |
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