Comparison ledger
CEE 100 Spin, SUSS MicroTec Falcon ACS 200 Coater Developer Cluster, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100 SpinCEE | Falcon ACS 200 Coater Developer ClusterSUSS MicroTec |
|---|---|---|
| OEM | CEE | SUSS MicroTec |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | SUSS MicroTec Falcon |
| Cited variants | — |
|
| Specifications | ||
| Configuration | Volts 115[2] | Developer (4)[1] |
| Wafer Sizes | — | 4, 5, 6, 8 inch[3] |
| Configuration (Asset #142142) | — | Developer (4) 2000 Vintage[1] |
| Configuration (Asset #142141) | — | Coater (3) 2000 Vintage[3] |
| OEM | — | SUSS[1] |
| Model | — | Falcon ACS 200[4] |
| Equipment type | — | Coater / Developer Cluster System[4] |
| Category | — | Resist Processing[4] |
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