Comparison ledger
CEE 200 Spin, SCREEN RF 300 A Photo Track, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 SpinCEE | RF 300 A Photo TrackSCREEN |
|---|---|---|
| OEM | CEE | SCREEN |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 200 | SCREEN RF 300 A Photo Track |
| Specifications | ||
| Phase | 1 Phase[1] | — |
| Type | Spin Coater[1] | — |
| Model | 200[1] | RF 300 A[3] |
| Make | CEE[1] | SCREEN / DNS[3] |
| Wafer Sizes | 8 inch[1] | — |
| Configuration | 1 Phase[1] | Modifications:[3] |
| Equipment type | Spin Coater[1] | — |
| Spin speed | 5000 rpm[2] | — |
| Substrate support | Flat substrates up to 200 mm or fragments[2] | — |
| Substrate thickness max | 12 mm[2] | — |
| Coating thickness | Uniform coating thickness up to 100 µm[2] | — |
| Robot Change | — | IHU, MHU (2), BHU[3] |
| Bake | — | CP (6), FRHP (7)[3] |
| Modifications | — | Robot Change: IHU, MHU (2), BHU; Bake: CP (6), FRHP (7); Loadport (10); Cleanbooth; SC Cup Parts (2) (change and retrofit); SD Cup Parts, Nozzle (2) (change and retrofit); 10 L Nowpack Cabinet; ETU-Cab; Resist 8 High Viscosity (140 cp); Low Height Mod (Top Module Separation); BARC/Resist Separation Drain; Facility Connection Parts (change and retrofit); Power BOX Mod Parts (change and retrofit); Fire Suppression[3] |
| Resist 8 High Viscosity | — | 140 cp[4] |
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