Comparison ledger
EV Group 101, OAI 650 S Flat Panel Exposure, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | |
|---|---|---|
| OEM | EV Group | OAI |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | OAI 650 S Flat Panel Exposure |
| Specifications | ||
| OEM | EV Group[1] | OAI[4] |
| Model | 101[1] | 650 S[4] |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Configuration | — | 20" panel[4] |
| Equipment type | — | Flat Panel Exposure System[4] |
| Panel capacity | — | 20-inch panel[4] |
| Substrate capacity | — | Substrates up to 20 inches square[5] |
| Originally for | — | Flat panel display substrates[5] |
| Supported smaller mask sizes | — | 4-inch and 6-inch rounds, 5-inch square[5] |
| Feature size | — | Below 2 μm[5] |
| Line width | — | ~ 1.5 μm[5] |
| Lamp installed | — | Used 2000W lamp installed; one spare[5] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →