Comparison ledger
Hitachi 1305 BSG 3, Panasonic PSX 307, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1305 BSG 3Hitachi | PSX 307Panasonic |
|---|---|---|
| OEM | Hitachi | Panasonic |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi 1305 BSG 3 | Panasonic PSX 307 |
| Specifications | ||
| Configuration | — | 50/60 Hz[1] |
| Electric Source | — | 200 / 208 / 220 / 230 / 240 V[1] |
| Model | — | PSX 307[1] |
| Equipment type | — | Plasma Cleaner[1] |
| Category | — | Wet Processing / Clean[2] |
| Cleaning method | — | Parallel plate RF back-sputtering method[3] |
| Gas for electrical discharge | — | Ar (option: O2)[3] |
| Pneumatic source | — | 0.49 MPa or more, 6.5 L/min (A.N.R.)[3] |
| Power source | — | 1-phase AC 200 V, 2.00 kVA (Full Load 5.00 kVA)[3] |
| Compatible voltage | — | 1-phase 208 / 220 / 230 / 240 V[3] |
| Dimensions / mass (base configuration) | — | W 930 mm × D 1 100 mm × H 1 450 mm / 555 kg[3] |
| Dimensions / mass (S type transfer system) | — | W 2 113 mm × D 1 100 mm × H 1 450 mm / 850 kg[3] |
| Dimensions / mass (M type transfer system) | — | W 2 266 mm × D 1 100 mm × H 1 450 mm / 725 kg[3] |
| Speed | — | Up to 360 substrates/strips per hour[3] |
| Compliance | — | Semi S2/S8 compliance[3] |
| Certification | — | CE certified[3] |
| Model number | — | NM-EFP1A[3] |
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