Comparison ledger
Hitachi 1305 BSG 3, SUSS MicroTec Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1305 BSG 3Hitachi | MaskSUSS MicroTec |
|---|---|---|
| OEM | Hitachi | SUSS MicroTec |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi 1305 BSG 3 | SUSS MicroTec Mask |
| Specifications | ||
| Configuration | — | TXF from OLED[1] |
| Model | — | Mask Cleaner[1] |
| Make | — | SUSS[1] |
| Category | — | Wet Processing / Clean[1] |
| Equipment type | — | Mask aligner[2] |
| Function | — | Uses UV light to transfer patterns from photomasks onto substrates coated with photoresist[2] |
| Exposure modes | — | Hard contact, soft contact, proximity, flood[2] |
| Spectral range | — | 365nm – 405nm[2] |
| Exposure resolution | — | < 1 µm[2] |
| Alignment accuracy | — | Topside – 500nm[2] |
| Substrate accommodation | — | Wafers up to 6"[2] |
| Uniformity | — | +- 5% over exposure area[2] |
| Image capture | — | CCD camera and monitor[2] |
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