SUSS MicroTec
Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
General reference — not yet source-verifiedSUSS MicroTec Mask is a mask-processing wet clean tool used for cleaning photomasks and related mask substrates in a semiconductor cleanroom environment.
How it works
General reference — not yet source-verifiedA mask cleaner is a wet-processing station. In this class of equipment, masks are treated with controlled liquid chemicals and rinses to remove contaminants, particles, and process residues without damaging the patterned surface. The workflow is centered on manual or semi-automated handling, chemical exposure, and drying in a clean environment.
Where it fits in the process flow
General reference — not yet source-verifiedMask cleaning sits in the lithography support flow, before a photomask is used for pattern transfer and also after mask handling steps that leave residue or contamination. It supports photolithography by helping preserve pattern fidelity and reticle cleanliness.
Applications
General reference — not yet source-verifiedThis equipment is used for photomask cleaning in microfabrication and lithography support work, especially where clean optical pattern transfer is required. It fits process environments that use wet benches, resist processing, and mask aligners.
What do the numbers mean?
Configuration & options1
- TXF from OLED[1]
Parts & consumables
Tracked replaceable assemblies, spares criticality, and availability status across all major subsystems. Each entry cites its source.
- SUSS Mask Aligner Power SupplyIn Productionsource[3]
Where are the manuals?
Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.
- User ManualManualepfl.ch
- Photomask Layout and Generation Guide Rev1.pdfDocumentduke.edu
- Photo-03 - SOP - MJB-3 Mask Aligner.pdfSOPumd.edu
- ManualManualuic.edu
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What model or name is given for the unit?
The unit is named SUSS Mask Cleaner.[1]
Not publicly documented
The following facts about the Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
Fewer than 3 independently cited specifications for the Mask are on record; the remainder await public documentation.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (20)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]Inventory photo
- [3]Equipment inventory listing
- [4]Equipment Capabilities - Electrical & Computer Engineering — ece.utoronto.caece.utoronto.ca
- [5]Main cleanroom | Quantum-Nano Fabrication and Characterization Facility | University of Waterloo — uwaterloo.cauwaterloo.ca
- [6]Cleanroom Equipment Capabilities and Materials Exclusions | Utah Nanofab — nanofab.utah.edunanofab.utah.edu
- [7]ECE Teaching Cleanroom | Electrical and Computer Engineering | UC Santa Barbara — ece.ucsb.eduece.ucsb.edu
- [8]Facilities | Integrated Nanosystems Research Facility — sites.uci.edusites.uci.edu
- [9]Exposure | Stanford Nanofabrication Facility — snfguide.stanford.edusnfguide.stanford.edu
- [10]MNTC - Equipment and Facilities | Service Centers — louisville.edulouisville.edu
- [11]PHOTO-17: MA-4 Suss Mask Aligner | Equipment | Maryland NanoCenter FabLab — nanocenter.umd.edunanocenter.umd.edu
- [12]Lithography — nanolab.berkeley.edunanolab.berkeley.edu
- [13]Tool Details - Harvard CNS — cns1.rc.fas.harvard.educns1.rc.fas.harvard.edu
- [14]Mask Aligner | Shared Materials Instrumentation Facility — smif.pratt.duke.edusmif.pratt.duke.edu
- [15]User Manual — epfl.chepfl.ch
- [16]Karl Suss MA6 Aligner | UCLA Nanolab — nanolab.ucla.edunanolab.ucla.edu
- [17]Suss MA6 Mask Aligner (system 2) — tmi.utexas.edutmi.utexas.edu
- [18]Manual — ncf.uic.eduncf.uic.edu
- [19]Lithography — tudelft.nltudelft.nl
- [20]SUSS MicroTec (formerly Karl SUSS) - Industry leader in the Advanced Packaging, MEMS and semiconductor markets — suss.com (May 17, 2003)web.archive.org
Last updated Jul 29, 2026.
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