SUSS MicroTec
Mask
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The SUSS Mask is a mask aligner used for photolithography. The SUSS Mask transfers patterns from photomasks onto photoresist-coated substrates using UV light. The SUSS Mask supports exposure wavelengths from 365nm to 405nm.[1]
What it is
General reference — not yet source-verifiedA mask cleaner is a wet-processing cleanroom tool used to remove contamination from photomasks. Mask cleaners support lithography by preparing masks for use in exposure equipment and by helping maintain pattern fidelity during repeated process use.
How it works
General reference — not yet source-verifiedMask cleaning tools generally apply chemical cleaning steps to the mask surface in a controlled clean environment. Mask cleaning tools are used to dislodge particles, remove residues, and rinse away process contaminants without altering the intended mask pattern.
Where it fits in the process flow
General reference — not yet source-verifiedMask cleaning sits in the lithography support flow around mask handling, inspection, and exposure preparation. Mask cleaning is typically performed before mask use when contamination is present and after process use when residues or particles must be removed prior to storage, inspection, or reuse.
Applications
General reference — not yet source-verifiedMask cleaners are used in microfabrication environments that rely on photomasks for pattern transfer. Mask cleaners support semiconductor, photonics, MEMS, and related cleanroom patterning work by helping keep masks free of particles and chemical residues.
What do the numbers mean?
Wafer handling2
- Function
- Uses UV light to transfer patterns from photomasks onto substrates coated with photoresist[1]
Optics & imaging6
Performance1
Configuration & options4
- TXF from OLED[2]
Parts & consumables
Tracked replaceable assemblies, spares criticality, and availability status across all major subsystems. Each entry cites its source.
Where are the manuals?
Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.
- User ManualManualepfl.ch
- Photomask Layout and Generation Guide Rev1.pdfDocumentduke.edu
- Photo-03 - SOP - MJB-3 Mask Aligner.pdfSOPumd.edu
- ManualManualuic.edu
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What is the equipment type?
The equipment is a SUSS Mask Cleaner.[2]
Not publicly documented
The following facts about the Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (22)Every fact above is drawn from these public sources
- [1]ece.utoronto.ca — ece.utoronto.caece.utoronto.ca
- [2]Inventory photo
- [3]Inventory photo
- [4]Equipment inventory listing
- [5]wiki.nanofab.ucsb.eduwiki.nanofab.ucsb.edu
- [6]wiki.nanofab.ucsb.eduwiki.nanofab.ucsb.edu
- [7]Main cleanroom | Quantum-Nano Fabrication and Characterization Facility | University of Waterloo — uwaterloo.cauwaterloo.ca
- [8]Cleanroom Equipment Capabilities and Materials Exclusions | Utah Nanofab — nanofab.utah.edunanofab.utah.edu
- [9]ECE Teaching Cleanroom | Electrical and Computer Engineering | UC Santa Barbara — ece.ucsb.eduece.ucsb.edu
- [10]Facilities | Integrated Nanosystems Research Facility — sites.uci.edusites.uci.edu
- [11]Exposure | Stanford Nanofabrication Facility — snfguide.stanford.edusnfguide.stanford.edu
- [12]MNTC - Equipment and Facilities | Service Centers — louisville.edulouisville.edu
- [13]PHOTO-17: MA-4 Suss Mask Aligner | Equipment | Maryland NanoCenter FabLab — nanocenter.umd.edunanocenter.umd.edu
- [14]Lithography — nanolab.berkeley.edunanolab.berkeley.edu
- [15]Tool Details - Harvard CNS — cns1.rc.fas.harvard.educns1.rc.fas.harvard.edu
- [16]Mask Aligner | Shared Materials Instrumentation Facility — smif.pratt.duke.edusmif.pratt.duke.edu
- [17]User Manual — epfl.chepfl.ch
- [18]Karl Suss MA6 Aligner | UCLA Nanolab — nanolab.ucla.edunanolab.ucla.edu
- [19]Suss MA6 Mask Aligner (system 2) — tmi.utexas.edutmi.utexas.edu
- [20]Manual — ncf.uic.eduncf.uic.edu
- [21]Lithography — tudelft.nltudelft.nl
- [22]SUSS MicroTec (formerly Karl SUSS) - Industry leader in the Advanced Packaging, MEMS and semiconductor markets — suss.com (May 17, 2003)web.archive.org
Last updated Oct 20, 2026.
Compare with similar tools
View all →The Glen/YES 1000FP is a plasma cleaning system designed to accept a range of shelf sizes for changing flat panel industry needs.
The 1000P is a plasma cleaning system with four 16 x 16 inch shelves and a total capacity of 1024 square inches.
