Comparison ledger
JDSU 1205-1, Onto Innovation Nanospec 210 Thin Film Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1205-1JDSU | Nanospec 210 Thin Film MeasurementOnto Innovation |
|---|---|---|
| OEM | JDSU | Onto Innovation |
| Category | Precision Optics | Precision Optics |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | JDSU 1205-1 | Onto Innovation Nanospec 210 Thin Film Measurement |
| Specifications | ||
| Manufacturer | JDSU[1] | Onto Innovation[3] |
| Model | 1205-1[1] | Nanospec 210[3] |
| Category | Fiber Optic Equipment[1] | — |
| Condition | Used[1] | — |
| Output Power | 0.5mW - 0.8mW[2] | — |
| Input Voltage | 115V[2] | — |
| Input Current | 0.12A[2] | — |
| Equipment type | — | Thin film measurement system[3] |
| Thickness range | — | 100 to 500,000 angstroms[4] |
| Typical measurement time | — | 2.5 seconds[4] |
| Spot size | — | 50 um with 5x objective; 25 um with 10x objective; 6.5 um with 40x objective[4] |
| Film types measured | — | Oxide on Silicon; Nitride on Silicon; Negative Resist on Silicon; Polysilicon on Oxide; Negative Resist on Oxide; Nitride on Oxide; Polyimide on Silicon; Positive Resist on Silicon; Positive Resist on Oxide[4] |
| Reflectance mode | — | Thick Films[4] |
| Reproducibility | — | 5A ± 5% depending upon the film type[4] |
Plan your fab
Building a Precision Optics process? Get a complete equipment list.
Open the fab equipment planner →