Comparison ledger
Karl Suss MA6, Nikon R10, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MA6Karl Suss | R10Nikon |
|---|---|---|
| OEM | Karl Suss | Nikon |
| Category | Lithography | Lithography |
| Wafer size | 150mm | 150mm |
| Process node | 1 micron and better; 0.6 µm under optimum conditions in vacuum mode | — |
| Introduced | — | 1986 |
| Production run | — | 1973–1979 |
| Lifecycle | — | Discontinued |
| Lifecycle milestones | — | 1979 Movie camera business discontinued |
| Control system | — | — |
| Generation | i-line | i-line |
| Family | Karl Suss MA6 | Nikon R10 |
| Cited variants |
| |
| Specifications | ||
| Substrate range | 5 x 5 mm dies to wafers up to 150 mm[4] | — |
| Maximum substrate thickness | 6 mm[4] | — |
| Resolution | 0.6 µm under optimum conditions in vacuum mode[4] | — |
| Light source | Broadband Hg lamp[4] | — |
| Wavelength channels | Channel 1 (405 nm) and Channel 2 (365 nm)[4] | — |
| Wafer chucks available | 3, 4, 6 inch[4] | — |
| Mask holders available | 4, 5, 7 inch[4] | — |
| Top side alignment precision | 0.5 µm[4] | — |
| Objectives | 5X, 10X, and 20X[4] | — |
| Alignment features | Splitfield microscope with storage and automatic movement between reference points; Bottom-Side Alignment (BSA); Wedge Error Compensation (WEC)[4] | — |
| Exposure modes | proximity, soft contact, hard contact, and vacuum[4] | — |
| Alignment accuracy | 0.5 µm (motorized top side alignment)[4] | — |
| Microscope objectives | 5X, 10X, and 20X[4] | — |
| Wedge Error Compensation | Yes (ensures parallelism between substrate and photomask)[4] | — |
| Maximum substrate size | 150 mm (wafers) or 5x5 mm to 150 mm irregular substrates[4] | — |
| Resolution (vacuum mode) | 0.6 µm (optimum conditions)[4] | — |
| Bottom-Side Alignment | Available (BSA)[4] | — |
| Resolution (optimum vacuum mode) | 0.6 µm[4] | — |
| Resolution (typical) | 1 µm and better[5] | — |
| Exposure methods | flood, proximity, soft contact, hard contact, low vacuum, vacuum[5] | — |
| Mask sizes | 2.5x2.5, 4x4, 5x5, 8x8 inches[5] | — |
| Wafer size (top-side alignment) | up to 6 inches (2, 3, 4, 6 inch)[5] | — |
| Wafer size (bottom-side alignment) | 3 and 4 inch[5] | — |
| Wavelength range | UV broadband 250-450 nm; i-line 365 nm; g-line 436 nm[5] | — |
| Light source (UIC) | Broadband Hg lamp with Channel 1 (405 nm) and Channel 2 (365 nm)[4] | — |
| Alignment accuracy (motorized top-side) | 0.5 µm[4] | — |
| wafer size | — | 150 mm[6] |
| exposure wavelength | — | i-line (365 nm)[6] |
| introduced | — | 1986[6] |
| technology generation | — | i-line[6] |
| Type | — | Silent super 8 cartridge movie camera[7] |
| Lens | — | Cine Nikkor Zoom, f: 1.4, F: 7-70 mm, zooming ratio 10x[7] |
| Lens optical construction | — | 10-group 14-element zoom lens[3] |
| Focusing | — | Manual, split image; macro focusing yes[7] |
| Zooming | — | Auto with 2 speeds and manual[7] |
| Filter size | — | 67 mm[7] |
| Viewfinder | — | Single-lens reflex with adjustable eyepiece; viewfinder information includes aperture scale[7] |
| Exposure control | — | Auto and manual; TTL Electric Eye; EE lock yes; exposure compensation +/-2 stops[7] |
| Film speed | — | Auto between 10/16 and 400/650 ASA (daylight/tungsten)[7] |
| Filter | — | Built-in 85A filter, coupled with movie light socket[7] |
| Filming speeds | — | 18, 24, 54 fps, single frame[7] |
| Shutter opening angle | — | Variable shutter; positions 0°, 40°, 80° and 160°[7] |
| Fading | — | Auto and manual fade-in/fade-out[7] |
| Rewinding / reverse filming | — | 100 frames approx, double exposure and lap dissolve; reverse filming 100 frames approx[7] |
| Sound | — | Double system, sound recording with synchronized tape recorder[7] |
| Connectors | — | Remote control socket yes; movie light socket Kodak type with filter control; flash synchronization socket yes[7] |
| Power source | — | 6 x AA batteries only; film drive motor DC micromotor[7] |
| Weight | — | 1930 g[7] |
| Dimensions | — | 68 x 260 x 200 mm[7] |
| Tripod socket | — | 1/4"[7] |
| Maker | — | Made in Japan by Nippon Kogaku[7] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →