Karl Suss
MA6
Plate 01Karl Suss MA6 Mask Aligner - Standard Operating Procedures
InrfucirvineWatch on YouTubePlate 02Exposure using contact aligner (Suss MA6)
Micro System Integration Center(uSIC), Tohoku UnivWatch on YouTubePlate 03Karl Suss MA6 Mask Aligner Part 2
Bid ServicellcWatch on YouTubePlate 04Karl Suss MA6 BSA Mask Aligner
ClassOneVideosWatch on YouTubePlate 05Video 1 of 2 - Karl Suss MA6/BA6 Mask Aligner (ID# 3733)
ClassOneEngineeringWatch on YouTubePlate 06Aligner: MA6 - 2 Part I (Operation) at DTU's cleanroom facility - Nanolab
DTU NanolabWatch on YouTubePlate 07Karl Suss MA6 - Backside and Topside Alignment
InrfucirvineWatch on YouTubePlate 08Karl Suss MA6 Mask Aligner
Bid ServicellcWatch on YouTubePlate 09Karl Suss MA6 Mask Aligner 7-26-13
Bid ServicellcWatch on YouTube
Wafer size
150mm
Node / era
1 micron and better; 0.6 µm under optimum conditions in vacuum mode
Performance
0.5 µm[1]
Optics
Channel 1 (405 nm) and Channel 2 (365 nm)[1]
What it is
The Karl Suss MA6 is a photolithography mask aligner used to transfer patterns from photomasks onto photoresist-coated substrates. It is a high resolution semi-automated tool intended for research and development and small volume production.[1]
How it works
The tool uses ultraviolet exposure to transfer mask patterns to resist on the substrate. Its alignment system includes a splitfield microscope for fiducial alignment, storage and automatic movement between reference points, and bottom-side alignment for aligning backside features to the photomask.[1]
Applications
The MA6 is used in semiconductor research, MEMS development, microfluidics, and optical component production.[1]
- semiconductor research
- MEMS-development
- microfluidics
- optical component production
What do the numbers mean?
Vacuum & pumping2
Wafer handling3
Optics & imaging3
Performance2
- Alignment features
- Splitfield microscope with storage and automatic movement between reference points; Bottom-Side Alignment (BSA); Wedge Error Compensation (WEC)[1]
Configuration & options1
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| MA4 | — | — | The MA6 and MA4 Mask Aligners use UV light to transfer patterns from photomasks onto substrates coated with photoresist; the MA6 is listed with wafers up to 6 inches while the MA4 is listed with wafers up to 4 inches. | ece.utoronto.ca[4] |
| MA6/BA6 | — | — | Front and backside alignment capabilities are stated for the MA6/BA6 mask aligners. | louisville.edu[5] |
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Publicly hosted documents referencing this tool, linked at their original location. Hosted by the linked institutions — availability may change.
- User ManualManualepfl.ch
- Photomask Layout and Generation Guide Rev1.pdfDocumentduke.edu
- PHOTO2 MA6 Top Side Align Operating Procedure Rev 5.pdfDocumentduke.edu
- ManualManualuic.edu
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What substrate sizes can the MA6 handle?
It can handle irregularly shaped substrates ranging from 5 x 5 mm dies to wafers up to 150 mm.[1]
What illumination wavelengths are specified?
The tool uses a broadband Hg lamp with channel 1 at 405 nm and channel 2 at 365 nm.[1]
What applications is it used for?
It is used in semiconductor research, MEMS development, microfluidics, and optical component production.[1]
Not publicly documented
The following facts about the MA6 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA6 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the MA6 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA6 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
No publicly documented compatible parts, consumables, or accessories for the MA6 are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (13)Every fact above is drawn from these public sources
- [1]ncf.uic.edu — ncf.uic.eduncf.uic.edu
- [2]Inventory photo
- [3]Inventory photo
- [4]ece.utoronto.ca — ece.utoronto.caece.utoronto.ca
- [5]louisville.edu — louisville.edulouisville.edu
- [6]Equipment Resources | CNF — cnf.cornell.educnf.cornell.edu
- [7]Lithography Recipes - UCSB Nanofab Wiki — wiki.nanotech.ucsb.eduwiki.nanotech.ucsb.edu
- [8]Suss MA6 Mask Aligner (system 2) — tmi.utexas.edutmi.utexas.edu
- [9]Tool Details - Harvard CNS — cns1.rc.fas.harvard.educns1.rc.fas.harvard.edu
- [10]Frontside/Backside Mask Aligner | Shared Materials Instrumentation Facility — smif.pratt.duke.edusmif.pratt.duke.edu
- [11]User Manual — epfl.chepfl.ch
- [12]Karl Suss MA6 Aligner | UCLA Nanolab — nanolab.ucla.edunanolab.ucla.edu
- [13]Mask/bond aligner:front/back capable [SUSS-align] | Quantum-Nano Fabrication and Characterization Facility | University — uwaterloo.cauwaterloo.ca
Last updated Jul 29, 2026.
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