Comparison ledger
Karl Suss MA6/BA6, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MA6/BA6Karl Suss | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Karl Suss | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | Samples ranging in size from 10mm to 150mm | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Karl Suss MA6/BA6 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| OEM | Karl Suss[1] | — |
| Model | MA6/BA6[1] | — |
| Category | Frontside/Backside Mask Aligner[2] | — |
| Application | For topside or backside photo alignment and exposure[1] | — |
| Backside alignment | Equipped with backside align capability with automated image capture and computer display optics[2] | — |
| Exposure wavelengths | 350-450nm[2] | — |
| Lamp house | 350W lamp house containing a 350W mercury short-arc lamp[2] | — |
| Exposure modes | Hard contact, soft contact, proximity, and vacuum contact[2] | — |
| Resolution | Line/space resolution of <1.0 microns under optimum conditions[2] | — |
| Alignment accuracy | 0.25 microns under optimum conditions[2] | — |
| Constant intensity control | Constant intensity controller (CIS) regulates lamp power to deliver constant intensity exposures[2] | — |
| Sample size range | 10mm to 150mm[2] | — |
| Mask size range | 4" to 7" sq.[2] | — |
| Minimum mask thickness | .09"[2] | — |
| Type | Frontside/Backside Mask Aligner[2] | — |
| Wafer size | Samples ranging in size from 10mm to 150mm[3] | — |
| Exposure methods | Flood, proximity, soft contact, hard contact, low vacuum, vacuum contact[4] | — |
| Mask size | 2.5 in x 2.5 in, 4 in x 4 in, 5 in x 5 in, and 8 in x 8 in[4] | — |
| Top-side alignment wafer size | Up to 6 in in diameter[4] | — |
| Bottom-side alignment wafer size | 3 in and 4 in chucks[4] | — |
| Maximum wafer thickness | 3 mm[4] | — |
| Line/space resolution | <1.0 microns under optimum conditions[3] | — |
| Mask thickness minimum | .09 in[3] | — |
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