Comparison ledger
KLA 1.112 PSL Wafer, Zeiss 1550, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1550Zeiss | |
|---|---|---|
| OEM | KLA | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 1.112 PSL Wafer | Zeiss 15xx |
| Cited variants | — | |
| Specifications | ||
| Configuration | NIST Traceable[3] | — |
| Wafer Size | 8 inch[3] | — |
| NIST Traceable | True[3] | — |
| Compatible Tools | Surfscan 6xy0 and Sp1[4] | — |
| Voltage | — | 30 kV[5] |
| Equipment type | — | Scanning Electron Microscope (SEM)[5] |
| Operating voltage | — | 30 kV[5] |
| SEM source type | — | Schottky field-emission[2] |
| Resolution | — | 2-5 nm size range[2] |
| Accelerating voltage | — | 0.1 - 30 kV[1] |
| Detectors | — | Everhart-Thornley, InLens, energy-selected backscattered electrons (ESB)[1] |
| Spatial resolution | — | High-vacuum 1.0nm at 20kV; 2.5nm at 1kV[6] |
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