Comparison ledger
KLA .204 PSL Wafer, KLA 2135, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 2135KLA | |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .204 PSL Wafer | KLA 2135 |
| Specifications | ||
| Configuration | NIST Traceable[1] | — |
| Wafer Size | 8 inch[2] | — |
| Traceability | NIST[3] | — |
| Compatible Tools | Surfscan 6xy0, Sp1[1] | — |
| NIST Traceable | Yes[2] | — |
| Compatible tools | Surfscan 6xy0 and Sp1 particle counters[2] | — |
| Product type | — | wafer inspection system[4] |
| Technology | — | advanced sensor and image processing technologies[4] |
| Inspection method | — | brightfield, small-pixel, high data rate, digital image processing technology[4] |
| Defect detection | — | detects all types of yield-relevant defects on all process layers[4] |
| Operational use | — | in-line monitoring of advanced processes[4] |
| Throughput | — | two- to three-times throughput improvement over the earlier model KLA 2132[4] |
| Inspection technology | — | brightfield, small-pixel, high data rate, digital image processing technology[4] |
| Throughput improvement over KLA 2132 | — | two to three times[4] |
| Laser type | — | 193nm DUV laser[5] |
| Laser output power | — | 200W[5] |
| Objective NA | — | 0.95[5] |
| Scan speed | — | 120 mm/sec[5] |
| Power supply input | — | 3-phase 480V[5] |
| Power supply output | — | 12V DC[5] |
| Target process node | — | 90nm–28nm[5] |
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