Comparison ledger
KLA .204 PSL Wafer, KLA Alpha Step D 600 Stylus Profiler, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ||
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .204 PSL Wafer | KLA Alpha Step |
| Specifications | ||
| Configuration | NIST Traceable[1] | — |
| Wafer Size | 8 inch[2] | — |
| Traceability | NIST[3] | — |
| Compatible Tools | Surfscan 6xy0, Sp1[1] | — |
| NIST Traceable | Yes[2] | — |
| Compatible tools | Surfscan 6xy0 and Sp1 particle counters[2] | — |
| Issue | — | Able to do scans, but the head is not working properly (not precise). The stylus does not have the expected freedom of movement[4] |
| Measurement type | — | 2D and 3D step height, roughness, 2D bow and shape, 2D thin film stress[5] |
| Vertical range | — | 0 - 1200 µm[5] |
| Stage type | — | Motorized stage with 200mm sample chuck[6] |
| Sample chuck size | — | 200 mm[6] |
| Optical lever sensor head vertical range | — | 0 - 1.200 µm[4] |
| Optical lever sensor head force range | — | 0.03 - 15 mg[4] |
| Measurement capability | — | Step height, roughness, bow, and thin film stress using Stoney's equation[6] |
| Software features | — | Advanced filtering, leveling, analysis; over forty surface parameters including slope, flatness, bearing ratio; extensive roughness parameters supporting ISO, ASME[6] |
| Industry applications | — | Semiconductor, compound semiconductor, LED, solar, MEMS, automotive, medical devices, universities and research labs[6] |
| Stylus options | — | Variety of styli available; shares stylus design with P-Series and HRP Series[5] |
| Step height standards | — | Thin and thick film NIST-traceable step height standards offered by VLSI Standards[5] |
| Operating system upgrade | — | Windows 10 upgrade available[6] |
| Keystone correction | — | Stated as advantage[6] |
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