Comparison ledger
KLA .496 PSL Wafer, Nikon LV100, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | LV100Nikon | |
|---|---|---|
| OEM | KLA | Nikon |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .496 PSL Wafer | Nikon LV100 |
| Specifications | ||
| Configuration | NIST Traceable[1] | Polarized microscope with heating stage[3] |
| Wafer size | 8 inch[1] | — |
| Traceability | NIST Traceable[1] | — |
| Compatible systems | Capable on Surfscan 6xy0 and SP1[1] | — |
| Category | Metrology & Inspection[2] | — |
| Instrument type | — | Polarized microscope with heating stage[3] |
| Listed model | — | Nikon LV100 POL[3] |
| Illuminator | — | EPI Illuminator with bright and darkfield[3] |
| Objectives | — | 5X, 10X, 20X, 50X, 100X objectives[3] |
| Camera head | — | Color camera head[3] |
| Heating stage | — | Instec HCS 3 heating stage[3] |
| Heating stage temperature range | — | -190 to 400 °C[3] |
| Model | — | LV100[4] |
| Head | — | Trinocular[5] |
| Eyepieces | — | 10x/22mm FOV[5] |
| Stage | — | 6 x 4 stage[5] |
| Condenser | — | LWD 0.65 N.A. condenser[5] |
| Illumination | — | Brightfield and darkfield[5] |
| Objective set | — | 5X, 10X, 20X, 50X[6] |
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