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Comparison ledger

OP 5240 Film Thickness Measurementversus150 e Mask

KLA OP 5240 Film Thickness Measurement, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
150 e MaskSUSS MicroTec
OEMKLASUSS MicroTec
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKLA OP 5240SUSS MicroTec 150 e Mask
Specifications
ConfigurationPatterned, unpatterned[1]—
Voltage230 V, 50/60 Hz[1]—
Software Revision LevelTFMS Rev 4.1a32[1]—
1 Prealigner, Brooks, ModelPRE-201-CE[1]—
1 ATM-Robot, single EEF, Brooks, ModelATM-105-1-DE (controller ESC-212)[1]—
ManufacturerKLA / Therma-wave[1]—
ModelOP 5240[1]—
Tool typeFilm thickness measurement system[2]—
Wafer sizes6 inch, 8 inch[1]—
Process capabilityPatterned, unpatterned[1]—
Power230 V, 50/60 Hz[1]—
Software revisionTFMS Rev 4.1a32[1]—
Wafer handling1 ATM-Robot, single EEF, Brooks, Model ATM-105-1-DE (controller ESC-212)[2]—
AccessoriesLight-Pen; VGA Monitor (Main Application); TFT (video)[1]—

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com