Comparison ledger
Lam Research 716 069688 809 ESC Assy, Tegal 110, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 716 069688 809 ESC AssyLam Research | 110Tegal |
|---|---|---|
| OEM | Lam Research | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research 716 069688 809 ESC Assy | Tegal 110 |
| Cited variants |
| |
| Specifications | ||
| Configuration | Inner, SI W/ Stud, Socket[1] | — |
| OEM | Lam[1] | — |
| Model | 716 069688 809[1] | — |
| Product type | ESC Assy[1] | — |
| Variant detail | Inner, SI W/ Stud, Socket[1] | — |
| Manufacturer | Lam[1] | — |
| Assembly designation | ESC Assy[1] | — |
| Description (listing A) | Inner, SI W/ Stud, Socket[1] | — |
| Description (listing B) | Inner, SI[2] | — |
| Product description | ESC Assy Inner, SI[2] | — |
| Asset # | 147371[2] | — |
| Last Confirm Date | December 10, 2025[2] | — |
| model | — | 110 SE[3] |
| application focus | — | process development applications[3] |
| process capability | — | deep silicon plasma etching[3] |
| capabilities | — | very high aspect ratio trench etch and profile control[3] |
| configuration | — | multiple configurations with minimum technical intervention[3] |
| System type | — | plasma etch system[4] |
| Supported components | — | MEMS and 3D-IC components[3] |
| Control capability | — | very high aspect ratio trench etch and profile control[4] |
| Physical description | — | compact[3] |
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