Comparison ledger
Lam Research A 6 Exelan HPT, Tegal 110, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | A 6 Exelan HPTLam Research | 110Tegal |
|---|---|---|
| OEM | Lam Research | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 1997 manufactured | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research A 6 Exelan HPT | Tegal 110 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | 3 Chambers[2] | — |
| Manufacturer | Lam Research[3] | — |
| Model | Alliance A 6 Exelan HPT Dielectric[3] | — |
| Category | Etch[3] | — |
| Wafer size | 8 inch (200 mm)[3] | — |
| Chamber configuration | Exelan HPT chambers (2) and 4520 chamber[3] | — |
| Vacuum & pumping | 1 TM Pump to Dual Pump (1 for Load Lock / 1 for TM)[4] | — |
| Gas & chemistry | To use 10 Gases, the Gas Box needs to be enhanced[4] | — |
| Configuration & options | 3 Chambers[2] | — |
| Condition | Refurbished[2] | — |
| Last confirmed date | November 12, 2024[2] | — |
| Vintage year | 1997[3] | — |
| Gas box note | To use 10 gases, the Gas Box needs to be enhanced[2] | — |
| model | — | 110 SE[1] |
| application focus | — | process development applications[1] |
| process capability | — | deep silicon plasma etching[1] |
| capabilities | — | very high aspect ratio trench etch and profile control[1] |
| configuration | — | multiple configurations with minimum technical intervention[1] |
| System type | — | plasma etch system[5] |
| Supported components | — | MEMS and 3D-IC components[1] |
| Control capability | — | very high aspect ratio trench etch and profile control[5] |
| Physical description | — | compact[1] |
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