Comparison ledger
Lam Research AutoEtch 590, Tegal 110, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | AutoEtch 590Lam Research | 110Tegal |
|---|---|---|
| OEM | Lam Research | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research AutoEtch 590 | Tegal 110 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | Cassette-to-cassette automatic plasma etching platform[2] | — |
| Chamber structure | Double airlock chamber structure[2] | — |
| Plasma configuration | Parallel plate plasma etching configuration[2] | — |
| Wafer handling | Automatic cassette-to-cassette wafer handling; single wafer plasma etch processing platform[2] | — |
| Control system | Upgraded Allwin21 PC controller and touchscreen monitor[2] | — |
| Programmable parameters | RF power, chamber pressure, gas flow control, electrode spacing, multi-step process recipes[2] | — |
| OEM | Lam Research[3] | — |
| Model | AutoEtch 590[3] | — |
| Equipment type | Etcher[3] | — |
| Wafer size | 4"~6"[2] | — |
| Process platform | Single wafer plasma etch processing platform[2] | — |
| Control interface | Allwin21 upgraded PC controller and industrial touchscreen monitor interface[2] | — |
| Process parameters | Programmable RF power, chamber pressure, gas flow control, electrode spacing, and multi-step process recipes[2] | — |
| model | — | 110 SE[1] |
| application focus | — | process development applications[1] |
| process capability | — | deep silicon plasma etching[1] |
| capabilities | — | very high aspect ratio trench etch and profile control[1] |
| configuration | — | multiple configurations with minimum technical intervention[1] |
| System type | — | plasma etch system[4] |
| Supported components | — | MEMS and 3D-IC components[1] |
| Control capability | — | very high aspect ratio trench etch and profile control[4] |
| Physical description | — | compact[1] |
Plan your fab
Building a Etch process? Get a complete equipment list.
Open the fab equipment planner →