Comparison ledger
Lam Research Kiyo 45, Lam Research Kiyo FX, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Kiyo 45Lam Research | Kiyo FXLam Research |
|---|---|---|
| OEM | Lam Research | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Kiyo | Lam Research Kiyo |
| Cited variants |
| — |
| Specifications | ||
| Configuration | 2 Chamber + 1 Strip[2] | With Equipment Front-End Module (EFEM)[5] |
| Loadport | Brooks 799-701175-005[2] | — |
| ATM Robot | Brooks P/N 138150[2] | — |
| TM Robot | Brooks P/N 201600-01[2] | — |
| MKS E28B-30200 Process Vacuum Gauge | 0.1 Torr[2] | — |
| MKS 625A-14059 Chamber Vacuum Gauge | 1 Torr[2] | — |
| MKS D24B12TCECB0 Micro Wave Vacuum Gauge | 100 Tor[2] | — |
| Chamber configuration | 2 Chamber + 1 Strip[2] | — |
| Process Vacuum Gauge | MKS E28B-30200, 0.1 Torr[2] | — |
| Chamber Vacuum Gauge | MKS 625A-14059, 1 Torr[2] | — |
| Micro Wave Vacuum Gauge | MKS D24B12TCECB0, 100 Torr[2] | — |
| Air Lock Heating Gauge | Teledyne HPM-2002-OBE-LM[2] | — |
| Turbo Pump | Edwards SCU 1500[2] | — |
| Turbo Pump Controller | Edwards SCU 1600[2] | — |
| Bias RF Generator | Lam 3156110-214[2] | — |
| TCP RF Generator | Lam 3156110-313[2] | — |
| Manufacturer | Lam Research[3] | — |
| Model | Kiyo 45[2] | — |
| Category | Etch[3] | — |
| System type | Reactive ion etch (RIE) system[3] | — |
| Wafer format | 300 mm[4] | — |
| Plasma technology | Transformer Coupled Plasma[4] | — |
| Wafer size | — | 12 inch[5] |
| Vintage | — | 2020[5] |
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