Comparison ledger
Lam Research Rainbow 4420 Polysilicon, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Rainbow 4420 PolysiliconLam Research | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | Cassette to Cassette Single Wafer Etcher | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Rainbow 4420 | Oxford Instruments 100 ICP Fluorine |
| Specifications | ||
| Wafer size | Cassette to Cassette Single Wafer Etcher[1] | 4 inch, 6 inch, 8 inch (with clamp change)[2] |
| Configuration | ESC[1] | — |
| OEM | Lam[1] | — |
| Model | Rainbow 4420[1] | — |
| Product name | Lam Rainbow 4420 Polysilicon Etcher[1] | — |
| Tool type | Cassette to Cassette Single Wafer Etcher[1] | — |
| ESC | ESC[1] | — |
| Process description | Classic[1] | — |
| Gas panel | Orbital gas panel[1] | — |
| Chiller | TCU 2080 Chiller[1] | — |
| Vintage | 2001 Vintage[1] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[2] |
| Cryo DRIE etch rate | — | up to 5 µm/min[2] |
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