Comparison ledger
Lam Research Rainbow 9600 SE II TCP, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Rainbow 9600 SE II TCPLam Research | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Rainbow | Oxford Instruments 100 ICP Fluorine |
| Specifications | ||
| Configuration | With DSQ[1] | — |
| Wafer Type | Flat[1] | — |
| Vlave Type | VAT Pendulum Valve 65 Series[2] | — |
| SMIF | No[2] | — |
| Bulkhead | Wall Facia are Missing[2] | — |
| Monochromator Endpoint | Dual Endpoint Detector - Lam # 853 001983 110[2] | — |
| Software | E 2.0.1-044[2] | — |
| RF | 3X on Board Trumpf Generators (Top, Bias, DSQ)[2] | — |
| Cart | No[2] | — |
| Robot Type | Harmonic Drive[2] | — |
| Loader Type | Hine Indexers 38 A[2] | — |
| Turbo Pumps | Alcatel ATH 1300 MT[2] | — |
| OEM | Lam Research[2] | — |
| Model | Rainbow 9600 SE II TCP[2] | — |
| Category | Etch[1] | — |
| Equipment type | Plasma etcher[2] | — |
| Wafer size | 6 inch[2] | 4 inch, 6 inch, 8 inch (with clamp change)[3] |
| Turbo pump configuration | Adixen Magpower (Turbo Pump)[2] | — |
| Endpoint | Dual Endpoint Detector[2] | — |
| Convertible size | Convertible to 8"[2] | — |
| Valve type | VAT Pendulum Valve 65 Series[2] | — |
| ESC | Coated Aluminum ESC - Lam # 718 094756 061[2] | — |
| Etch architecture | Inductively coupled plasma (TCP)[1] | — |
| DSQ | With DSQ[2] | — |
| Endpoint detection | Dual endpoint detector[2] | — |
| Endpoint optics | Monochromator[2] | — |
| Turbo pump controller | Adixen Magpower[2] | — |
| Temperature controller | 12 CH Anafaze Temp Controller[2] | — |
| Throttle valve controller | AC 2 Controller[2] | — |
| Pendulum valve controller | VAT PM 7 Controller[2] | — |
| Manual WVDS controller | Present[2] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[3] |
| Cryo DRIE etch rate | — | up to 5 µm/min[3] |
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