Comparison ledger
Nikon 1505 G 6 E, Nikon S 204 B, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | S 204 BNikon |
|---|---|---|
| OEM | Nikon | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1988– | 2002– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon 1505 | Nikon S 204 B |
| Specifications | ||
| Configuration | 5" reticle[1] | — |
| Resolution | 650 nm[2] | — |
| Numerical Aperture | 0.54[2] | — |
| Reduction | 5x[2] | — |
| Exposure Field | 15 x 15 mm[2] | — |
| Alignment Accuracy | 130 nm[2] | — |
| Wafer Size | 4 inch[1] | — |
| Light Source | g-line[3] | — |
| Introduction Year | 1988[2] | — |
| NA (Numerical Aperture) | 0.54[2] | — |
| Make | Nikon[1] | — |
| Model | 1505 G 6 E[1] | S 204 B[4] |
| Category | Stepper[1] | Lithography[6] |
| Wafer Sizes | 4 inch[1] | — |
| Exposure type | g-line[2] | — |
| NA | 0.54[2] | 0.68 (max)[6] |
| Exposure field | 9.3 x 18.8 mm[2] | — |
| OEM | — | Nikon[4] |
| Machine designation | — | NSR-S204B[5] |
| Equipment type | — | Stepper[4] |
| Exposure wavelength | — | 248nm[6] |
| Laser type | — | KrF excimer laser[6] |
| Reduction ratio | — | 4:1[6] |
| Wafer size | — | 300mm[6] |
| Reticle size | — | 6"[6] |
| Field size | — | 25 x 33 mm2[6] |
| Manufactured | — | June 2002[6] |
| System designation | — | NSR-S204B[5] |
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