Comparison ledger
Nikon 1505 G 6 E, OAI 200 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | 200 MaskOAI |
|---|---|---|
| OEM | Nikon | OAI |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1988– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon 1505 | OAI 200 Mask |
| Cited variants | — |
|
| Specifications | ||
| Configuration | 5" reticle[2] | Double Sided[5] |
| Resolution | 650 nm[3] | one micron[1] |
| Numerical Aperture | 0.54[3] | — |
| Reduction | 5x[3] | — |
| Exposure Field | 15 x 15 mm[3] | — |
| Alignment Accuracy | 130 nm[3] | — |
| Wafer Size | 4 inch[2] | — |
| Light Source | g-line[4] | — |
| Introduction Year | 1988[3] | — |
| NA (Numerical Aperture) | 0.54[3] | — |
| Make | Nikon[2] | — |
| Model | 1505 G 6 E[2] | 200[5] |
| Category | Stepper[2] | — |
| Wafer Sizes | 4 inch[2] | — |
| Exposure type | g-line[3] | — |
| NA | 0.54[3] | — |
| Exposure field | 9.3 x 18.8 mm[3] | — |
| Type | — | tabletop mask aligner[1] |
| Alignment precision | — | one micron[1] |
| Alignment accuracy | — | 2 µm[6] |
| Objectives | — | 5x, 10x, and 2x objectives[6] |
| Exposure modes | — | contact, soft-contact, and proximity[7] |
| Light source options | — | collimated Hg lamp UV light source or UV LED light source[1] |
| UV LED wavelengths | — | 365nm, 405nm, or 436nm[1] |
| Chuck | — | dual windows in chuck for 4" wafers[5] |
| Alignment axes | — | X, Y, and Z micrometers[1] |
| Frontside alignment | — | designed for high-precision frontside alignment in microfabrication processes[6] |
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