OAI
200 Mask
What it is
How it works
Where it fits in the process flow
Applications
What do the numbers mean?
Wafer handling2
- Dual Windows in Chuck for 4" Wafers[1]
Optics & imaging7
Performance4
- Frontside alignment
- designed for high-precision frontside alignment in microfabrication processes[3]
Configuration & options3
- Double Sided[1]
Vintage & configurations
Documented models & variants
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| Model 200IR | — | — | Backside alignment configuration involving infrared illumination to align substrates bottom-side to mask. | oainet.com[2] |
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What exposure modes does the OAI Model 200 support?
The OAI Model 200 supports contact, soft-contact, and proximity exposure modes.[4]
Not publicly documented
The following facts about the 200 Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 200 Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the 200 Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the 200 Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the 200 Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 200 Mask are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]oainet.com — oainet.comoainet.com
- [3]cleanrooms.research.ucf.edu — cleanrooms.research.ucf.educleanrooms.research.ucf.edu
- [4]equipment-tools.research.iu.edu — equipment-tools.research.iu.eduequipment-tools.research.iu.edu
- [5]Microfluidics and BioMed – OAI — oainet.com (Apr 20, 2026)web.archive.org
Last updated Oct 12, 2026.
Compare with similar tools
View all →Brooks 017-0146-01 is a prealigner manufactured by Brooks.
The Ultratech 1000 Family is a photolithography step-and-repeat 1X steppers family using the Wynne Dyson optical design.
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
