Comparison ledger
Nikon 1505 G 6 E, SUSS MicroTec MJB 3 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | MJB 3 MaskSUSS MicroTec |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1988– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon 1505 | SUSS MicroTec MJB |
| Specifications | ||
| Configuration | 5" reticle[1] | Refurbished[4] |
| Resolution | 650 nm[2] | 0.6 µm[5] |
| Numerical Aperture | 0.54[2] | — |
| Reduction | 5x[2] | — |
| Exposure Field | 15 x 15 mm[2] | — |
| Alignment Accuracy | 130 nm[2] | — |
| Wafer Size | 4 inch[1] | — |
| Light Source | g-line[3] | — |
| Introduction Year | 1988[2] | — |
| NA (Numerical Aperture) | 0.54[2] | — |
| Make | Nikon[1] | — |
| Model | 1505 G 6 E[1] | MJB 3[7] |
| Category | Stepper[1] | Lithography[8] |
| Wafer Sizes | 4 inch[1] | — |
| Exposure type | g-line[2] | — |
| NA | 0.54[2] | — |
| Exposure field | 9.3 x 18.8 mm[2] | — |
| Power | — | 350W lamphouse with Ushio USH-350DS Hg lamp[5] |
| Wafer size | — | 3 inch[5] |
| Lamp | — | 350W lamphouse with Ushio USH-350DS Hg lamp[5] |
| Optics type | — | UV400 near UV optics, 350-450 nm[5] |
| Microscope | — | Splitfield microscope with Leica objectives 3.5x/10x/20x[6] |
| Vacuum chuck size | — | 3 inch[5] |
| Mask holder size | — | 3x3 inch[5] |
| OEM | — | SUSS MicroTec[7] |
| Tool type | — | Mask aligner[8] |
| Wafer sizes | — | 3 inch[5] |
| Max wafer size | — | 3" diameter[9] |
| Exposure optics | — | UV400 near UV optics, 350-450 nm[6] |
| Lamp house | — | 350W lamphouse with Ushio USH-350DS Hg lamp[5] |
| Exposure modes | — | Vacuum contact, Hard contact, Soft contact[10] |
| Configured alignment | — | Top side alignment[10] |
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