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Comparison ledger

NSR 1505 G 6 Eversus150 e Mask

Nikon NSR 1505 G 6 E, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
150 e MaskSUSS MicroTec
OEMNikonSUSS MicroTec
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones1988 Introduction—
Control system——
Generation——
FamilyNikon NSRSUSS MicroTec 150 e Mask
Specifications
Configuration0.65um G-line[1]—
ManufacturerNikon[1]—
ModelNSR 1505 G 6 E[1]—
Wafer size6 inch[1]—
Process/generation0.65 um G-line[1]—
Tool typeStepper[1]—
Introduction year1988[2]—

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com