Waferpedia

Comparison ledger

NSR 2205 i 8 A i-Lineversus806

Nikon NSR 2205 i 8 A i-Line, OAI 806, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
806OAI
OEMNikonOAI
CategoryLithographyLithography
Wafer size6"6"
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyNikon NSR 2205OAI 806
Specifications
Resolution0.5µm[1]—
Computer TypePDP11[2]—
Rentical Size5 Inch[2]—
Field Sizes15 / 17.5 / 20mm[2]—
Wafer Size6 Inch Flat[2]—
Reticle Libraries1[2]—
Wafer LoaderType 1[2]—
Wafer sizeWafer Loader Pre-alignment 2[2]—
ConfigurationBarcode Reader[2]—
Wafer Loader Indexers2[2]—
AutofocusSingle Point[2]—
Chuck TypeCeramic Ring Chuck[2]—
Water StageBallscrew[2]—
MCS2 Version2.4B[2]—
OEMNikon[2]—
ModelNSR 2205 i 8 A i-Line[2]OAI 806 Mask Aligner[3]
CategoryLithography[1]—
Retical size5 Inch[2]—
Wafer size flat6 Inch Flat[2]—
Wafer loader pre-alignment2[2]—
Barcode readerYes[2]—
FIAYes[2]—
LSAYes[2]—
LIAYes[2]—
LevellingYes[2]—
Vintage1991[2]—
Patterning substrate size—up to 6 inches[3]
Contact modes—soft, hard, and proximity contact modes[3]
Alignment accuracy—submicron[3]
UV source—collimated UV light source[3]
Workholding—vacuum chuck[3]
Optics—integrated microscope optics[3]
Stage—motorized stage[3]
Optional capability—backside alignment[3]
Substrate size—up to 6 inches[3]
Light source—collimated UV[3]
Backside alignment—optional[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]colorado.educolorado.edu