Comparison ledger
Onto Innovation Nanospec 210 Thin Film Measurement, Perkin Elmer 1050 UV-VIS, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Nanospec 210 Thin Film MeasurementOnto Innovation | 1050 UV-VISPerkin Elmer |
|---|---|---|
| OEM | Onto Innovation | Perkin Elmer |
| Category | Precision Optics | Precision Optics |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Onto Innovation Nanospec 210 Thin Film Measurement | Perkin Elmer 1050 UV-VIS |
| Specifications | ||
| Manufacturer | Onto Innovation[1] | Perkin Elmer[3] |
| Model | Nanospec 210[1] | 1050[3] |
| Equipment type | Thin film measurement system[1] | — |
| Thickness range | 100 to 500,000 angstroms[2] | — |
| Typical measurement time | 2.5 seconds[2] | — |
| Spot size | 50 um with 5x objective; 25 um with 10x objective; 6.5 um with 40x objective[2] | — |
| Film types measured | Oxide on Silicon; Nitride on Silicon; Negative Resist on Silicon; Polysilicon on Oxide; Negative Resist on Oxide; Nitride on Oxide; Polyimide on Silicon; Positive Resist on Silicon; Positive Resist on Oxide[2] | — |
| Reflectance mode | Thick Films[2] | — |
| Reproducibility | 5A ± 5% depending upon the film type[2] | — |
| Asset ID | — | 82948[3] |
| Last Confirm Date | — | August 23, 2024[3] |
| Instrument type | — | Spectrometer[3] |
| Use | — | Analyzing ultraviolet and visible light absorption spectra[3] |
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