Comparison ledger
Panasonic PSX 307, Semitool 11600 SRD, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | PSX 307Panasonic | 11600 SRDSemitool |
|---|---|---|
| OEM | Panasonic | Semitool |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Panasonic PSX 307 | Semitool 11600 SRD |
| Specifications | ||
| Configuration | 50/60 Hz[1] | Ceramic[4] |
| Electric Source | 200 / 208 / 220 / 230 / 240 V[1] | — |
| Model | PSX 307[1] | 11600 SRD[4] |
| Equipment type | Plasma Cleaner[1] | Spin Rinse Dryer[4] |
| Category | Wet Processing / Clean[2] | — |
| Cleaning method | Parallel plate RF back-sputtering method[3] | — |
| Gas for electrical discharge | Ar (option: O2)[3] | — |
| Pneumatic source | 0.49 MPa or more, 6.5 L/min (A.N.R.)[3] | — |
| Power source | 1-phase AC 200 V, 2.00 kVA (Full Load 5.00 kVA)[3] | — |
| Compatible voltage | 1-phase 208 / 220 / 230 / 240 V[3] | — |
| Dimensions / mass (base configuration) | W 930 mm × D 1 100 mm × H 1 450 mm / 555 kg[3] | — |
| Dimensions / mass (S type transfer system) | W 2 113 mm × D 1 100 mm × H 1 450 mm / 850 kg[3] | — |
| Dimensions / mass (M type transfer system) | W 2 266 mm × D 1 100 mm × H 1 450 mm / 725 kg[3] | — |
| Speed | Up to 360 substrates/strips per hour[3] | — |
| Compliance | Semi S2/S8 compliance[3] | — |
| Certification | CE certified[3] | — |
| Model number | NM-EFP1A[3] | — |
| Manufacturer | — | Semitool[4] |
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