Comparison ledger
Plasma-Therm SLR 720 RIE, Tegal 110, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SLR 720 RIEPlasma-Therm | 110Tegal |
|---|---|---|
| OEM | Plasma-Therm | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Plasma-Therm SLR 720 RIE | Tegal 110 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | With disconnect boxes[2] | — |
| Equipment type | Reactive ion etcher (RIE)[3] | — |
| Chamber configuration | Two chambers: one RIE chamber and one PECVD chamber[4] | — |
| Lower electrode | 11-inch[5] | — |
| Load lock | Manual load lock system[5] | — |
| RF generator | RF Power Products RF5S, 500 W, 13.56 MHz[4] | — |
| model | — | 110 SE[1] |
| application focus | — | process development applications[1] |
| process capability | — | deep silicon plasma etching[1] |
| capabilities | — | very high aspect ratio trench etch and profile control[1] |
| configuration | — | multiple configurations with minimum technical intervention[1] |
| System type | — | plasma etch system[6] |
| Supported components | — | MEMS and 3D-IC components[1] |
| Control capability | — | very high aspect ratio trench etch and profile control[6] |
| Physical description | — | compact[1] |
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