Comparison ledger
SPTS Synaps, Tegal 110, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SynapsSPTS | 110Tegal |
|---|---|---|
| OEM | SPTS | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SPTS Synaps | Tegal 110 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | Chamber only, for Omega fxP Etch system w/o MF[2] | — |
| Chamber configuration | Single chamber, for Omega fxP Etch system, without MF (matching network)[3] | — |
| Wafer size | 6 inch[3] | — |
| Equipment type | Etch module[3] | — |
| System | Omega fxP Etch system[2] | — |
| Matching network | Without MF (matching network)[3] | — |
| model | — | 110 SE[1] |
| application focus | — | process development applications[1] |
| process capability | — | deep silicon plasma etching[1] |
| capabilities | — | very high aspect ratio trench etch and profile control[1] |
| configuration | — | multiple configurations with minimum technical intervention[1] |
| System type | — | plasma etch system[4] |
| Supported components | — | MEMS and 3D-IC components[1] |
| Control capability | — | very high aspect ratio trench etch and profile control[4] |
| Physical description | — | compact[1] |
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