Comparison ledger
SUSS MicroTec 150 e Mask, SUSS MicroTec MA 200 Automatic Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | MA 200 Automatic MaskSUSS MicroTec |
|---|---|---|
| OEM | SUSS MicroTec | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | Capable of working with wafer masks up to 9″ x 9″ |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec 150 e Mask | SUSS MicroTec MA 200 |
| Specifications | ||
| Wafer size | — | Capable of working with wafer masks up to 9″ x 9″[1] |
| Configuration | — | Configured for top side alignment[1] |
| OEM | — | SUSS MicroTec[2] |
| Category | — | Lithography[2] |
| Alignment configuration | — | Configured for top side alignment[1] |
| Lamp house | — | 1000 watt lamp house[1] |
| Lamp power supply unit | — | CIC 1000 LH 1000[1] |
| Optic | — | UV 400 Optic (for 365nm & 405nm)[1] |
| Lamp adapter | — | Lamp adapter LH1000/HBO MA8/MA200[1] |
| Light sensor | — | Suss 2 Channel light sensor 365/405nm[1] |
| Auto alignment system | — | AL 3000 Auto alignment system[1] |
| Microscope | — | DVM8 microscope with motorized objective movement with field expanders[1] |
| Objective | — | Objective 20x Olympus UMPL FL 20 X – working distance 12mm[1] |
| Pre-aligner | — | XRS pre aligner[1] |
| Mask holder | — | Large clear field proximity mask holder for 9″ corner marks, with 8″ exposure area[1] |
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