SUSS MicroTec
MA 200 Automatic Mask
The SUSS MA 200 Automatic Mask is a lithography mask aligner configured for top-side alignment. The SUSS MA 200 Automatic Mask is capable of working with wafer masks up to 9″ x 9″. The SUSS MA 200 Automatic Mask includes a 1000 watt lamp house and a UV 400 optic for 365nm and 405nm.[1][2]
Plate 01Suss MA200 Compact Mask Aligner (2015 vintage) - Demonstration
Lithography Equipment SupportWatch on YouTubePlate 02Suss MA200 Mask Aligner Refurbishment Process
ClassOneVideosWatch on YouTube
Wafer size
Capable of working with wafer masks up to 9″ x 9″
Power
1000 watt lamp house[1]
Performance
Configured for top side alignment[1]
Optics
UV 400 Optic (for 365nm & 405nm)[1]
What it is
How it works
The MA 200 is configured for top-side alignment, in which the mask is positioned over the wafer while alignment microscopes view both mask and wafer targets from above.[1][2]
The machine employs the AL 3000 automatic alignment system together with a DVM8 microscope having motorized objective movement and field expanders.[1][2]
A 1000 watt lamp house powered by a CIC 1000 LH 1000 lamp power supply unit provides the exposure source.[1][2]
An XRS prealigner orients the wafer before it is presented to the aligner, and ergonomic cassette platforms hold the wafer cassettes.[1][2]
Where it fits in the process flow
Applications
Automatic mask aligners of the MA 200 family are used for micro-electromechanical systems (MEMS), radio-frequency (RF) devices, and power devices, as well as for wafer-level packaging applications such as 3D integration, fan-out, bumping, compound semiconductors, and image sensors.[3][5]
The exposure modes cover proximity lithography for microstructures down to 3.5 micrometers and contact or vacuum contact exposure for sub-micron resolution below 0.8 micrometers.[3][5]
A top-side alignment accuracy down to 0.5 micrometers is achieved with the DirectAlign technique using live images rather than stored patterns.[3][5]
The system supports automated mask management through an integrated mask library, and thermal compensation counteracts thermal runout during processing.[3][5]
What do the numbers mean?
Power & electrical4
Wafer handling2
- Ergonomic Cassette plateforms[1]
Optics & imaging8
- UV 400 Optic (for 365nm & 405nm)[1]
- DVM8 microscope with motorized objective movement with field expanders[1]
- Objective 20x Olympus UMPL FL 20 X – working distance 12mm[1]
- Large clear field proximity mask holder for 9″ corner marks, with 8″ exposure area[1]
- Mask holder
- Large clear field proximity mask holder for 9″ corner marks, with 8″ exposure area[1]
Performance4
Configuration & options8
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the MA 200 Automatic Mask are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the MA 200 Automatic Mask are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the MA 200 Automatic Mask are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the MA 200 Automatic Mask are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the MA 200 Automatic Mask are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the MA 200 Automatic Mask is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (5)Every fact above is drawn from these public sources
- [1]Inventory photo
- [2]waferpedia.com — waferpedia.comwaferpedia.com
- [3]MA200 Gen3 | SUSS — suss.comsuss.com
- [4]Brooks 017-0146-01 Prealigner vs SUSS MicroTec MA 200 Automatic Mask comparison | Waferpedia — waferpedia.comwaferpedia.com
- [5]MA200 Gen3 | SUSS — suss.comsuss.com
Last updated Oct 13, 2026.
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