Comparison ledger
Ulvac SOPHI 200 Ion, Varian 0216 7696, E 11368072 ESC, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SOPHI 200 IonUlvac | |
|---|---|---|
| OEM | Ulvac | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Ulvac SOPHI 200 Ion | Varian 0216 7696, E 11368072 ESC |
| Specifications | ||
| Dose range (actual dose | 1010~1014 ions/cm2)[1] | — |
| Beam current (~500μA) - Throughput | more than 100 pieces/h (6in)[1] | — |
| Model | SOPHI 200[2] | — |
| Equipment type | Ion Implanter[3] | — |
| Wafer sizes | 6 inch[1] | — |
| Dose range | actual dose: 1010~1014 ions/cm2[1] | — |
| Beam current | ~500μA[1] | — |
| Throughput | more than 100 pieces/h (6in)[1] | — |
| Manufacturer | Ulvac[2] | — |
| Wafer size | 6 inch[1] | — |
| Configuration | — | Platen ADV-S Type[4] |
| Type | — | ESC Platen ADV-S Type[4] |
| Category | — | Ion Implantation[5] |
Plan your fab
Building a Ion Implantation process? Get a complete equipment list.
Open the fab equipment planner →