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The Nanospec 210XP is a reflectometry tool used for non-contact spectro-reflectometry and manual film thickness measurement of transparent films on reflective substrates.
The NanoSpec Film Thickness Measurement System is a metrology tool used for measuring the thickness of thin films such as silicon dioxide and silicon nitride.
The Nanospec AFT-6100 is a metrology instrument listed in the optical measurement section of the EPFL Center of MicroNanoTechnology (CMi) equipment portfolio.
General referenceThe Nanospec 3000 is a film thickness measurement system belonging to the optical metrology class used for characterizing thin films in semiconductor and precision optics manufacturing.
General referenceThe Nanospec 4455 is a film thickness measurement system. Machines of this class are metrology tools used to measure thin films on substrates during semiconductor and related manufacturing processes.