Comparison ledger
Applied Materials 0010 47763, Applied Materials Centura eMax Nitride, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | Centura eMax NitrideApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Applied Materials Centura |
| Specifications | ||
| Configuration | 2nd Source New[1] | 2 Chamber Emax[4] |
| Type | Monopolar Dual Heated[2] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | — |
| OEM | Applied Materials[1] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | — |
| Quantity available (source) | 1[2] | — |
| Gas | — | CF4, CH2F2, CHF3, Ar, O2, N2[4] |
| OS | — | AMAT Legacy[4] |
| Buffer Robot | — | HP[4] |
| Chiller 1 | — | AMAT Endura HX 18706-01[4] |
| Chiller 2 | — | Thermo Electron HX 150 106178026[4] |
| Wafer size | — | 8 inch[4] |
| Chamber configuration | — | 2 Chamber Emax; 1 Orienter/degas[4] |
| Gas chemistry | — | CF4, CH2F2, CHF3, Ar, O2, N2[4] |
| Operating system | — | AMAT Legacy[4] |
| Chamber #A | — | eMAX[4] |
| Chamber #B | — | eMAX[4] |
| Chamber #C | — | EMPTY[4] |
| Chamber #D | — | EMPTY[4] |
| Chamber #E | — | EMPTY[4] |
| Chamber #F | — | Orienter[4] |
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