Comparison ledger
Applied Materials 0010 47763, Lam Research AutoEtch 480, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | AutoEtch 480Lam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | Plasma etch |
| Introduced | — | 1981 |
| Production run | — | 1981– |
| Lifecycle | — | — |
| Lifecycle milestones | — | 1981 Product introduction · 1982 First system sold · 1982 First sale |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Lam Research AutoEtch 480 |
| Specifications | ||
| Configuration | 2nd Source New[1] | — |
| Type | Monopolar Dual Heated[2] | automated polysilicon plasma etcher[7] |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | — |
| OEM | Applied Materials[1] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | — |
| Quantity available (source) | 1[2] | — |
| Part number | 0010-47763[2] | — |
| Component type | Electrostatic chuck (ESC) assembly[4] | — |
| Designation | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Wafer size reference | 300 mm[5] | — |
| Associated part number | 0041-39086[6] | — |
| Etch type | — | Plasma etch (polysilicon)[7] |
| Automation level | — | Automated[7] |
| Process | — | Polysilicon plasma etch[7] |
| Automation | — | Automated[7] |
| System type | — | in-line, cassette-to-cassette, fully automated, single wafer, planar etching system[8] |
| Process modes | — | PPE-Planar Plasma Etching; RIE-Reactive Ion Etching (optional)[8] |
| Throughput | — | 30-60 wafers/hour[8] |
| Wafer size | — | 3 in., 100mm, or 125mm[8] |
| Etch rate | — | greater than 3,000 A/min[8] |
| Uniformity | — | better than ± 5% across wafer[8] |
| RF power supply | — | 500 watts, automatically stabilized; 3.56 MHz, crystal controlled; 52 ohms output impedance[8] |
| Facility power | — | 208 VAC, 3 phase, 5 wire, 20 amps, 50/60 Hz[8] |
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