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Lam Research

AutoEtch 480

EtchPlasma etchIntroduced Produced 1981–Lam Research AutoEtch 480 family
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The AutoEtch 480 is an automated polysilicon plasma etcher introduced by Lam Research in 1981. The AutoEtch 480 was Lam Research's first product. The first AutoEtch 480 system was sold in January 1982.[1]

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Produced

1981–

Node / era

Plasma etch

Performance

greater than 3,000 A/min[2]

What it is

The Lam Research AutoEtch 480 is an automated polysilicon plasma etcher. The Lam Research AutoEtch 480 was introduced in 1981. The Lam Research AutoEtch 480 was Lam Research's first product. The first AutoEtch 480 system was sold in January 1982.[1][3][4]

How it works

General reference — not yet source-verified

Plasma etchers generally operate after a patterned masking layer defines areas to be protected and areas to be opened. Plasma etchers generally use process gases, radio-frequency power, pressure control, and wafer temperature control to shape etch behavior. Single-wafer plasma etchers generally emphasize controlled chamber conditions and repeatable wafer handling.

Where it fits in the process flow

Lam Research products are used primarily in front-end wafer processing, which involves the steps that create the active components of semiconductor devices and their wiring. Plasma etch is one of the semiconductor manufacturing product areas built by Lam Research.[1]

Applications

General reference — not yet source-verified

Polysilicon etch tools are generally used where a patterned conductive or gate-related film must be defined on the wafer. Plasma etch in this class is generally chosen when directional material removal and controlled profile formation are needed. Descum and resist-strip functions in this class support cleanup of residual photoresist around patterned features.

  • Polysilicon etching

What do the numbers mean?

Power & electrical2

RF power supply
500 watts, automatically stabilized; 3.56 MHz, crystal controlled; 52 ohms output impedance[2]
Accurate?
Facility power
208 VAC, 3 phase, 5 wire, 20 amps, 50/60 Hz[2]
Accurate?

Wafer handling4

System type
in-line, cassette-to-cassette, fully automated, single wafer, planar etching system[2]
Accurate?
Throughput
30-60 wafers/hour[2]
Accurate?
Wafer size
3 in., 100mm, or 125mm[2]
Accurate?
Uniformity
better than ± 5% across wafer[2]
Accurate?

Performance1

Etch rate
greater than 3,000 A/min[2]
Accurate?

Configuration & options6

Type
automated polysilicon plasma etcher[1]2 sources
Accurate?
Etch type
Plasma etch (polysilicon)[1]
Accurate?
Automation level
Automated[1]
Accurate?
Process
Polysilicon plasma etch[1]
Accurate?
Automation
Automated[1]
Accurate?
Process modes
PPE-Planar Plasma Etching; RIE-Reactive Ion Etching (optional)[2]
Accurate?

Vintage & configurations

  1. 1981Production start[1]

    Lam Research introduced its first product, the AutoEtch 480, in 1981.

  2. 1981Product introduction[1]

    AutoEtch 480 introduced

  3. 1982-01Production start[1]

    The first system was sold in January 1982.

  4. 1982-01First system sold[1]

    The first system was sold in January 1982.

  5. 1982-01First sale[1]

    First system sold in January 1982.

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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • RF power supply500 watts, automatically stabilized; 3.56 MHz, crystal controlled; 52 ohms output impedance[2]
  • Facility power208 VAC, 3 phase, 5 wire, 20 amps, 50/60 Hz[2]

Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What kind of equipment is the Lam Research AutoEtch 480?

The Lam Research AutoEtch 480 is an automated polysilicon plasma etcher.[1][3][4]

When was the AutoEtch 480 introduced?

The AutoEtch 480 was introduced in 1981.[1][5][3][4]

Was the AutoEtch 480 Lam Research's first product?

The AutoEtch 480 was Lam Research's first product.[1][3][4]

How is the AutoEtch 480 configured for wafer handling?

The AutoEtch 480 is an in-line, cassette-to-cassette, fully automated, single-wafer planar etching system. The AutoEtch 480 uses airlocks on either side of the process chamber, and wafers are automatically loaded and unloaded through those airlocks.[2]

What process modes does the AutoEtch 480 support?

The AutoEtch 480 supports PPE planar plasma etching. The AutoEtch 480 also offered RIE reactive ion etching as an option.[2]

Not publicly documented

The following facts about the AutoEtch 480 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented variants, configuration options, or revision breakpoints of the AutoEtch 480 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the AutoEtch 480 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the AutoEtch 480 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • No publicly documented compatible parts, consumables, or accessories for the AutoEtch 480 are on record.

    Answerable by: an OEM parts catalog or a service engineer

  • No publicly hosted manuals, SOPs, or datasheets for the AutoEtch 480 are on record.

    Answerable by: university cleanroom staff or an OEM application specialist

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Sources & citations

Sources (5)Every fact above is drawn from these public sources
  1. [1]en.wikipedia.org — en.wikipedia.orgen.wikipedia.org
  2. [2]chiphistory.org — chiphistory.orgchiphistory.org
  3. [3]AutoEtch 480 — Lam Research | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
  4. [4]Lam Research AutoEtch 480 family | Waferpedia — waferpedia.comwaferpedia.com
  5. [5]Lam Research AutoEtch 480 — chiphistory.orgchiphistory.org
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Last updated Oct 20, 2026.

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