Waferpedia

Comparison ledger

0010 47763versusWS 820 L

Applied Materials 0010 47763, SCREEN WS 820 L, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0010 47763Applied Materials
WS 820 LSCREEN
OEMApplied MaterialsSCREEN
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1996 Vintage · 1997 Vintage
Control system——
Generation——
FamilyApplied Materials 0010 47763SCREEN WS 820 L
Specifications
Configuration2nd Source New[1]SiN Wet Etching[7]
TypeMonopolar Dual Heated[2]—
DescriptionASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3]—
Possible MaterialsAl2O3 (aluminum oxide) or AlN (aluminum nitride)[2]—
Model0010-47763[1]WS 820 L[8]
OEMApplied Materials[1]—
Material (possible)Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2]—
ApplicationFixing wafers in etching process (PVD, CVD, ETCH)[2]—
Quantity available (source)1[2]—
Part number0010-47763[2]—
Component typeElectrostatic chuck (ESC) assembly[4]—
DesignationASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3]—
Wafer size reference300 mm[5]—
Associated part number0041-39086[6]—
Chemical—H3PO4 , IPA , HF[7]
PLC (Loader / Unloader)—Mitsubishi A3A CPU P21[7]
Olifra—wafer flatzone[7]
Main PC—Mitsubishi/LM (hard disket OK)[7]
Signal Tower—3 color (GYR) Patlite lamp type[7]
Phase—3 Phase, 208V, 170a, 100V[7]
Left/ Right Stepping Motor (Oriental—VEXTA A 6259)[7]
Up/Down Stepping Motor (Oriental—VEXTA PK 596 H[7]
Wafer Size—8 inch[7]
Process—SiN wet etching, nitride strip[7]
Chemicals—H3PO4, IPA, HF[7]
Transfer Type—Rear type transfer flow[7]
IPA Dryer Fire Extinguisher—Yes[7]
PLC—Mitsubishi A3A CPU P21[7]
Wafer Flatzone—Olifra[7]
Front Carrier Detector Sensor—Yes[7]
Power—3 Phase, 208V, 170A, 100V[7]
Carrier Loading—2 carrier loading (stocker 8 carrier loading)[7]
Stepping Motors (Left/Right)—Oriental VEXTA A 6259[7]
Stepping Motors (Up/Down)—Oriental VEXTA PK 596 H[7]
Measuring Units—H3PO4 measuring tank, DIW measuring tank, H3PO4 DIW spiking pump, HF measuring tank[7]
Resistivity Meter—DKK AQ 10 (Final Rinse)[7]
Circulation Heater—In-Line Heater[7]
Circulation Pump—FS 30 HT 2[7]
Circulation Filter—High Temp Filter[7]
Aspirator Drain—Yes[7]
Pump—FS 30 HT 2[7]
Filter—High Temp Filter[7]
Equipment type—Wet Station[8]
Process description—SiN wet etching - Process for Nitride Strip[7]

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Sources (8)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]saulcontrol.comsaulcontrol.com
  3. [3]getspares.comgetspares.com
  4. [4]waferpedia.comwaferpedia.com
  5. [5]powerdukedcs.compowerdukedcs.com
  6. [6]ygplc.comygplc.com
  7. [7]inventory listing
  8. [8]Equipment inventory listing