SCREEN
WS 820 L
The SCREEN / DNS WS 820 L is a wet station for 8-inch wafers used for SiN wet etching and nitride strip processes. The WS 820 L uses chemicals including H3PO4, IPA, and HF.[1]
What it is
How it works
General reference — not yet source-verifiedWet stations move wafers through chemical, rinse, and dry stages using automated handling and contained process modules. Wet stations generally combine chemical baths, recirculation, temperature control, metering, rinsing, and drying so that wafer surfaces can be treated while limiting cross contamination and maintaining process repeatability.
Where it fits in the process flow
General reference — not yet source-verifiedWet etch stations are placed in process flows where a material must be removed or a surface must be cleaned by liquid chemistry rather than by plasma. Wet etch stations commonly sit after film deposition or lithography steps when exposed material must be stripped, etched, or cleaned before the next patterning, deposition, or inspection operation.
Applications
The SCREEN WS 820 L can be used for SiN wet etching. The SCREEN WS 820 L can be used for nitride strip processing.[1]
What do the numbers mean?
Power & electrical2
Vacuum & pumping4
Wafer handling11
Gas & chemistry2
Control & software3
Configuration & options22
Vintage & configurations
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- ChemicalH3PO4 , IPA , HF[1]
- Phase3 Phase, 208V, 170a, 100V[1]
- ConfigurationH 3 PO 4 DIW Spiking Pump[1]
- ChemicalsH3PO4, IPA, HF[1]
- Power3 Phase, 208V, 170A, 100V[1]
- Measuring UnitsH3PO4 measuring tank, DIW measuring tank, H3PO4 DIW spiking pump, HF measuring tank[1]
- Circulation PumpFS 30 HT 2[1]
- PumpFS 30 HT 2[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the WS 820 L are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented variants, configuration options, or revision breakpoints of the WS 820 L are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the WS 820 L are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the WS 820 L are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the WS 820 L is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the WS 820 L are on record.
Answerable by: an OEM parts catalog or a service engineer
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (4)Every fact above is drawn from these public sources
- [1]Equipment inventory listing
- [2]Equipment inventory listing
- [3]Equipment inventory listing
- [4]Equipment inventory listing
Last updated Oct 19, 2026.
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