Comparison ledger
Axcelis 200 PCU, Axcelis GSD 200 E 2 Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 PCUAxcelis | GSD 200 E 2 IonAxcelis |
|---|---|---|
| OEM | Axcelis | Axcelis |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 2000 Vintage | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | Axcelis GSD 200 |
| Cited variants | — | |
| Specifications | ||
| P/N | SC 4840 A[3] | — |
| Frequency | 50 Hz[3] | — |
| Phase | 3 Phase[3] | — |
| Voltage | 400 V[3] | — |
| High Current | — | GSD-200EE[4] |
| Configuration | — | Software Version 6.12.3[4] |
| Ion Source Type | — | ELS[4] |
| Source Material Type | — | Moly[4] |
| Single Stage Extraction | — | 90keV[4] |
| Beamline Version | — | Standard[4] |
| Source Turbo Pump (P1) | — | STP H2000C[4] |
| Beam Line Cryo Pump (P3) | — | CTI Onboard 10[4] |
| End Station Cryo Pump (P2) | — | CTI Onboard 8[4] |
| Manufacturer | — | Axcelis[4] |
| Model | — | GSD 200 E 2[4] |
| Category | — | Ion Implantation[5] |
| Wafer size | — | 6 inch[4] |
| Software version | — | 6.12.3[4] |
| GEM/SECS interface | — | Present[4] |
| Cassette capability | — | 4-cassette capability[4] |
| Automated beam tuning and set-up | — | w/Eaton Autotune[4] |
| Energy range | — | 90KeV[4] |
| Beamline and source pumps | — | Beamline and Source Pumps[5] |
| Gas Type | — | MFC Type and Model[4] |
| Ar | — | UNIT 1662 10SCCM - SDS[4] |
| BF3 | — | UNIT 1662 10SCCM - SDS[4] |
| AsH3 | — | UNIT 1662 10SCCM - SDS[4] |
| PH3 | — | UNIT 1660 10SCCM - SDS[4] |
| External Facilities Connections | — | Ar N2[4] |
| Cryo Compressors | — | CTI 9600 (1)[4] |
| Remote Disk Chiller | — | SMC-HRS050[4] |
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